Work

Double-patterning decomposition, design compliance, and verification algorithms at 32nm hp

Year: 2008

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.801381

Authors: Alexander Tritchkov, Petr Glotov, Sergiy Komirenko, Emile Sahouria, Andres Torres, Ahmed Seoud, Vincent Wiaux

Institutions: Mentor Graphics (United States), IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W2057317577

FWCI: 1.422

Cites: 7

Cited by: 7

Related to: 10