Work

Pulsed-laser annealing of ion-implanted polycrystalline silicon films

Year: 1979

Type: article

Source: Applied Physics Letters

DOI: 10.1063/1.90678

Authors: C. P. Wu, C. W. Magee

Institution: RCA (United States)

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2057784331

FWCI: 3.538

Cites: 10

Cited by: 18

Related to: 10