Work

Gaps analysis for CD metrology beyond the 22nm node

Year: 2013

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.2012472

Authors: Benjamin Bunday, Thomas A. Germer, Victor Vartanian, Aaron Cordes, Aron Cepler, Charles Settens

Institutions: National Institute of Standards and Technology, University at Albany, State University of New York

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2058095599

FWCI: 14.25

Cites: 51

Cited by: 78

Related to: 10