Work

Double dipole lithography for 65-nm node and beyond: a technology readiness review

Year: 2004

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.557797

Authors: Stephen D. Hsu, Mark Eurlings, Eric Hendrickx, Douglas J. Van Den Broeke, Tsann-Bim Chiou, J. Fung Chen, Thomas L. Laidig, Xuelong Shi, Jo Finders

Institutions: ASML (Netherlands), IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2058136702

FWCI:

Cites:

Cited by: 1

Related to: 10