Work

Microwave ECR plasma electron flood for low pressure wafer charge neutralization

Year: 2012

Type: conference-paper

Source: AIP conference proceedings

DOI: 10.1063/1.4766562

Authors: Bo Vanderberg, Tomoya Nakatsugawa, William Divergilio

Institution: Axcelis Technologies (United States)

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2058733325

FWCI: 0.405

Cites: 4

Cited by: 5

Related to: 10