Work

16nm with 193nm immersion lithography and double exposure

Year: 2010

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.846677

Authors: Valery Axelrad, Michael C. Smayling

Institutions: Sequoia (United States), Tela Innovations (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2058788538

FWCI: 3.85

Cites: 3

Cited by: 18

Related to: 10