Control of duty ratio in waveguide gratings using a near-field holographic lithography system with a variable aperture
Year: 2008
Type: article
Source: Microelectronic Engineering
Institution: Inha University
Language: English
Topic: Photonic and Optical Devices
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2059014366
