Work

Paving the way for ultimate device scaling through nanoelectronic device simulations

Year: 2013

Type: conference-paper

Source: Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon

DOI: 10.1109/ulis.2013.6523489

Authors: M. Luisier, A. Szabo

Institutions: ETH Zurich, Integrated Systems Laboratory

Language: English

Topic: Advancements in Semiconductor Devices and Circuit Design

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Science Foundation, Schweizerischer Nationalfonds zur Förderung der Wissenschaftlichen Forschung, Centro Svizzero di Calcolo Scientifico

OpenAlex ID: W2061108317

FWCI:

Cites: 15

Cited by: 1

Related to: 8