Work

33.4: An Improvement Process for Gate Oxide of LTPS TFT by Using N 2 O Plasma Nitridation

Year: 2004

Type: conference-paper

Source: SID Symposium Digest of Technical Papers

DOI: 10.1889/1.1825714

Authors: Lin‐En Chou, Hung‐Che Ting

Institution: Industrial Technology Research Institute

Language: English

Topic: Thin-Film Transistor Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2062907968

FWCI:

Cites: 6

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Related to: 10