Work

Application of rigorous electromagnetic simulation to SLM-based maskless lithography for 65-nm node

Year: 2003

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.518747

Authors: Ebo H. Croffie, Nick Eib, Neal P. Callan, Nabila Baba-Ali, Azat Latypov, Jason Hintersteiner, Torbjorn Sandstrom, Arno Bleeker, Kevin D. Cummings

Institution: ASML (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2063970140

FWCI: 2.243

Cites: 8

Cited by: 9

Related to: 10