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Introducing a novel flow to estimate challenges encountered while transitioning from RET development to manufacturable solution

Year: 2013

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.2013605

Authors: Jacky Cheng, Robin Chia, Ying Gong, Omar ElSewefy, GekSoon Chua, YeeMei Foong, Aasutosh Dave, Alvin Chua, DongQing Zhang, Vlad Liubich, Pat Lacour, Alex Tritchkov

Institutions: GlobalFoundries (Singapore), Mentor Graphics (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W2064089014

FWCI:

Cites:

Cited by: 1

Related to: 10