Work

Formation of 0.3-nm-high stepped polymer surface by thermal nanoimprinting

Year: 2014

Type: article

Abstract: We performed atomic-scale surface patterning with a vertical resolution of approximately 0.3 nm on a poly(methyl methacrylate) (PMMA) polymer sheet (10 × 10 mm 2 ) by thermal nanoimprinting using an atomically stepped sapphire template (α-Al 2 O 3 single crystal). The sapphire mold with ( ) r -plane exhibited regularly arranged straight steps with a uniform height of approximately 0.31 nm. The template nanopattern could be transferred onto the surface of the PMMA sheet under the imprinting conditions of 0.2 MPa load for 300 s at 140 °C. Atomic stairs with approximately 0.26-nm-high straight steps and approximately 600-nm-wide terraces were formed on the PMMA surface.

Source: Applied Physics Express

DOI: 10.7567/apex.7.055202

Authors: Geng Tan, Naoya Inoue, Tomoyuki Funabasama, Masahiro Mita, Norimichi Okuda, Junichi Mori, Koji Koyama, Satoru Kaneko, Masaru Nakagawa, Akifumi Matsuda, Mamoru Yoshimoto

Institutions: Tokyo Institute of Technology, Kyodo International Inc. (Japan), GENERAL Inc. (Japan), Tohoku University, Institute of Multidisciplinary Research for Advanced Materials, Tohoku University

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: bronze

Funders: Nippon Sheet Glass Foundation for Materials Science and Engineering, Ministry of Education, Culture, Sports, Science and Technology, Kato Foundation for Promotion of Science, Amada Foundation, Japan Society for the Promotion of Science

Awards: Solid-phase crystallization of oxide thin films on nanoscale-controlled substrates via post-annealing under uniaxial compression for exploring the novel functionalities, Atomic-scale transcription of natural nano-pattern onto glassy materials

OpenAlex ID: W2064922274

FWCI: 1.383

Cites: 28

Cited by: 20

Related to: 10