Work

Review of reliability issues in high-k/metal gate stacks

Year: 2008

Type: conference-paper

Source: IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA)

DOI: 10.1109/ipfa.2008.4588195

Authors: R. Degraeve, M. Aoulaiche, B. Kaczer, Ph. Roussel, T. Kauerauf, S. Sahhaf, G. Groeseneken

Institutions: IMEC, KU Leuven

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2064979487

FWCI: 7.108

Cites: 8

Cited by: 66

Related to: 10