Work

Dielectric properties of parylene AF4 as low-k material for microelectronic applications

Year: 2011

Type: article

Source: Thin Solid Films

DOI: 10.1016/j.tsf.2011.10.025

Authors: A. Kahouli, A. Sylvestre, F. Jomni, E. André, J.-L. Garden, B.Yangui, B. Berge, J. Legrand

Institutions: Institut polytechnique de Grenoble, Tunis University, Centre National de la Recherche Scientifique, Université Joseph Fourier, Laboratoire de Génie Électrique de Grenoble, Tunis El Manar University, Institut Néel

Language: English

Topic: High voltage insulation and dielectric phenomena

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2065584532

FWCI: 1.517

Cites: 23

Cited by: 32

Related to: 10