Work

CMP process comparison for 150mm larger area InSb (111)B focal plane array substrates

Year: 2009

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.830114

Authors: P. Flint, L. P. Allen, G. Dallas, B. D. Ruchert, D. Bakken, K. Blanchat, S. R. Vangala, W. D. Goodhue, D. Bliss, H. Dauplais

Institutions: University of Massachusetts Lowell, United States Air Force Research Laboratory

Language: English

Topic: Advanced Surface Polishing Techniques

Subfield: Industrial and Manufacturing Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: U.S. Department of Defense

OpenAlex ID: W2065736643

FWCI: 1.077

Cites: 4

Cited by: 2

Related to: 10