Work

0.1 μ scale lithography using a conventional electron beam system

Year: 1985

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena

DOI: 10.1116/1.583195

Authors: C. Dix, P. G. Flavin, P. Hendy, M. E. Jones

Institution: BT Research

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: University of Glasgow

OpenAlex ID: W2066735579

FWCI: 1.628

Cites:

Cited by: 24

Related to: 10