Work

Metal Silicides in CMOS Technology: Past, Present, and Future Trends

Year: 2003

Type: article

Source: Critical reviews in solid state and materials sciences/CRC critical reviews in solid state and materials sciences

DOI: 10.1080/10408430390802431

Authors: Shi-Li Zhang, Mikael Östling

Institution: KTH Royal Institute of Technology

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2067112372

FWCI: 7.252

Cites:

Cited by: 384

Related to: 10