Work

Characteristics of HfO2 thin films grown by plasma atomic layer deposition

Year: 2005

Type: article

Source: Applied Physics Letters

DOI: 10.1063/1.2005370

Authors: Jinwoo Kim, Seokhoon Kim, Hyeongtag Jeon, M.-H. Cho, K.-B. Chung, Choelhwyi Bae

Institutions: Hanyang University, Korea Research Institute of Standards and Science, North Carolina State University

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2067285151

FWCI: 6.058

Cites: 13

Cited by: 70

Related to: 10