Work

Free-standing spectral purity filters for extreme ultraviolet lithography

Year: 2012

Type: article

Source: Journal of Micro/Nanopatterning Materials and Metrology

DOI: 10.1117/1.jmm.11.2.021115

Authors: Nikolay I. Chkhalo, Mikhail N. Drozdov, Evgeniy B. Kluenkov, Alexsei Y. Lopatin, Valerii I. Luchin, Nikolay N. Salashchenko, Nikolay N. Tsybin, Leonid A. Sjmaenok, Vadim E. Banine, Andrei M. Yakunin

Institutions: Russian Academy of Sciences, Institute for Physics of Microstructures, ASML (Netherlands)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Institute for Physics of Microstructures of the Russian Academy of Sciences

OpenAlex ID: W2069914735

FWCI: 3.001

Cites: 20

Cited by: 44

Related to: 10