Work

Ion beam exposure characteristics of resists

Year: 1979

Type: article

Source: Journal of Vacuum Science and Technology

DOI: 10.1116/1.570321

Authors: T. M. Hall, A. Wagner, L. F. Thompson

Institution: AT&T (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2070807995

FWCI: 5.743

Cites:

Cited by: 74

Related to: 10