Work

Illumination optimization of periodic patterns for maximum process window

Year: 2002

Type: article

Source: Microelectronic Engineering

DOI: 10.1016/s0167-9317(02)00516-6

Authors: Robert Socha, Mark Eurlings, Frank Nowak, Jo Finders

Institution: ASML (Netherlands)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2071134870

FWCI:

Cites: 5

Cited by: 7

Related to: 10