Work

Ion projection lithography for resistless patterning of thin magnetic films

Year: 2000

Type: article

Source: Microelectronic Engineering

DOI: 10.1016/s0167-9317(00)00410-x

Authors: W.H. Bruenger, M. Torkler, C. Dzionk, B.D. Terris, L. Folks, D. Weller, H. Rothuizen, P. Vettiger, G. Stangl, W. Fallmann

Institutions: Fraunhofer Institute for Silicon Technology, IBM Research - Almaden, IBM Research - Zurich, TU Wien

Language: English

Topic: Ion-surface interactions and analysis

Subfield: Computational Mechanics

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2071215744

FWCI: 4.325

Cites: 6

Cited by: 14

Related to: 10