Litho process control via optimum metrology sampling while providing cycle time reduction and faster metrology-to-litho turn around time
Year: 2011
Type: conference-paper
DOI: 10.1117/12.879218
Authors: K.-H. Chen, Jacky Huang, W.-T. Yang, C.-M. Ke, Y.-C. Ku, John Lin, Kaustuve Bhattacharyya, Evert Mos, Mir Shahrjerdy, Maurits van der Schaar, Steffen Meyer, Spencer Lin, Jon Wu, Sophie Peng, Albert Li, Nikki Chang, Roy Chu, Cathy Wang
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2071820197