Work

Characteristics of hollow cathode discharge plasma and its application for the reactive ion plating of TiN and TiC

Year: 1993

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/1.578691

Authors: K. W. Whang, Y. W. Seo

Institution: Seoul National University

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2072159233

FWCI: 0.961

Cites:

Cited by: 22

Related to: 10