Preferred orientation of ZnO films controlled by r.f. sputtering
Year: 1982
Type: article
Source: Thin Solid Films
Authors: D.K. Murti, T.L. Bluhm
Institution: Xerox (Canada)
Language: English
Topic: ZnO doping and properties
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2073465985