Work

Processing and Characterization of 300 mm Argon-Annealed Wafers

Year: 2003

Type: article

Source: Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena

DOI: 10.4028/www.scientific.net/ssp.95-96.105

Authors: Timo Müller, E. Daub, H. Yokota, R. Wahlich, P. Krottenthaler, Wilfried von Ammon

Institution: Kagawa University

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2073643003

FWCI: 0.668

Cites: 10

Cited by: 6

Related to: 10