Work

Transistor characteristics with Ta/sub 2/O/sub 5/ gate dielectric

Year: 1998

Type: article

Source: IEEE Electron Device Letters

DOI: 10.1109/55.728906

Authors: Donggun Park, Ya-chin King, Qiang Lu, Tsu-Jae King, Chenming Hu, A. Kalnitsky, Sing-Pin Tay, Chia-Cheng Cheng

Institutions: University of California, Berkeley, Lam Research (United States)

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2074059639

FWCI: 16.76

Cites: 13

Cited by: 103

Related to: 10