Work

Sub-10 nm pattern placement verification of quantum tomography freestanding gratings

Year: 1998

Type: article

Source: Microelectronic Engineering

DOI: 10.1016/s0167-9317(98)00050-1

Authors: M.F.A. Eurlings, J.T.M. van Beek, M.J. Verheijen, J.P. Weterings, H.C.W. Beijerinck

Institutions: Eindhoven University of Technology, Philips (Netherlands), Signify (Netherlands)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2074972046

FWCI:

Cites: 6

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Related to: 10