Work

In situ high temperature synchrotron-radiation diffraction studies of silicidation processes in nanoscale Ni layers

Year: 2003

Type: article

Source: Microelectronic Engineering

DOI: 10.1016/s0167-9317(03)00419-2

Authors: J Rinderknecht, H Prinz, T Kammler, N Schell, E Zschech, K Wetzig, T Gessner

Institutions: Helmholtz-Zentrum Dresden-Rossendorf, Leibniz Institute for Solid State and Materials Research, Chemnitz University of Technology

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2076483430

FWCI: 0.186

Cites: 12

Cited by: 3

Related to: 10