Work

Imaging performance improvements by EUV mask stack optimization

Year: 2011

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.884504

Authors: Natalia Davydova, Eelco van Setten, Robert de Kruif, Dorothe Oorschot, Mircea Dusa, Christian Wagner, Jiong Jiang, Wei Liu, Hoyoung Kang, Hua-yu Liu, Petra Spies, Nils Wiese, Markus Waiblinger

Institutions: ASML (Netherlands), Carl Zeiss (Germany)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2078780337

FWCI: 2.122

Cites: 4

Cited by: 10

Related to: 10