Work

Advantages of BARC and photoresist matching for 193-nm photosensitive BARC applications

Year: 2010

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.846608

Authors: Joyce Lowes, Victor Pham, Jim Meador, Charlyn Stroud, Ferdinand Rosas, Ramil-Marcelo L. Mercado, Mark Slezak

Institution: Brewer Science (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2079011990

FWCI: 0.428

Cites: 6

Cited by: 3

Related to: 10