Surface‐Modified High‐k Oxide Gate Dielectrics for Low‐Voltage High‐Performance Pentacene Thin‐Film Transistors
Year: 2007
Type: article
Source: Advanced Functional Materials
Authors: C. S. Kim, S. J. Jo, S. W. Lee, W. J. Kim, H. K. Baik, S. J. Lee
Institutions: Yonsei University, Kyungsung University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2080790002