Work

Two-photon lithography of nanorods in SU-8 photoresist

Year: 2005

Type: article

Abstract: Studies on two-photon lithography in negative SU-8 photoresist demonstrate the possibility of obtaining mechanically stable, stress-free, extended nanorods having lateral sizes of about 30 nm (corresponding to λ/25 resolution). The high resolution achievable with the given combination of materials and fabrication techniques demonstrates its potential for the fabrication of large-scale nanostructures, such as photonic crystals with photonic stop gaps at visible wavelengths.

Source: Nanotechnology

DOI: 10.1088/0957-4484/16/6/039

Authors: Saulius Juodkazis, Vygantas Mizeikis, Kock Khuen Seet, Masafumi Miwa, Hiroaki Misawa

Institutions: Hokkaido University, Japan Science and Technology Agency, Research Institute for Electronic Science, Hokkaido University, Wakayama University

Language: English

Topic: Nonlinear Optical Materials Studies

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: bronze

OpenAlex ID: W2082197045

FWCI: 9.194

Cites: 11

Cited by: 311

Related to: 10