Phase transformation and semiconductor-metal transition in thin films of VO2 deposited by low-pressure metalorganic chemical vapor deposition
Year: 2002
Type: article
Source: Journal of Applied Physics
DOI: 10.1063/1.1518148
Institution: Indian Institute of Science Bangalore
Language: English
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2084975813