Work

Acid catalyzed resist for KrF excimer laser lithography.

Year: 1991

Type: article

Source: Journal of Photopolymer Science and Technology

DOI: 10.2494/photopolymer.4.337

Authors: YASUNOBU ONISHI, HIROKAZU NIKI, YOSHIHITO KOBAYASHI, RUMIKO HORIGUCHI HAYASE, NAOHIKO OYASATO, OSAMU SASAKI

Institution: Toshiba (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: diamond

OpenAlex ID: W2086442741

FWCI: 1.344

Cites: 2

Cited by: 14

Related to: 10