Work

Properties of thin films deposited from HMDSO/O2 induced remote plasma: Effect of oxygen fraction

Year: 2007

Type: article

Source: Vacuum

DOI: 10.1016/j.vacuum.2007.10.009

Authors: S. Saloum, M. Naddaf, B. Alkhaled

Institution: Atomic Energy Commission of Syria

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2086995336

FWCI: 2.973

Cites: 33

Cited by: 47

Related to: 10