Thermoelectric power of polycrystalline Si films prepared by microwave plasma chemical vapour deposition
Year: 1996
Type: article
Source: Thin Solid Films
Authors: So Yonekubo, Kiichi Kamimura, Yoshiharu Onuma
Institution: Shinshu University
Language: English
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2089019455
