TiO2-Coated Transparent Conductive Oxide (SnO2:F) Films Prepared by Atmospheric Pressure Chemical Vapor Deposition with High Durability against Atomic Hydrogen
Year: 2006
Type: article
Abstract: The durability of textured transparent conductive oxide (TCO) thin films against atomic hydrogen was investigated. An ultrathin TiO 2 layer of 2 nm thickness was deposited on textured fluorine-doped tin oxide (SnO 2 :F) films, successively by atmospheric pressure chemical vapor deposition (AP-CVD). TCO films with a TiO 2 layer showed a higher optical transmittance and a lower resistivity after exposure to atomic hydrogen excited by very high frequency (VHF) plasma, while TCO films without a TiO 2 layer showed a lower optical transmittance and a higher resistivity after the exposure. These TCO films were characterized by X-ray photoelectron spectroscopy (XPS) and secondary ion mass spectroscopy (SIMS) before and after the exposure to atomic hydrogen.
DOI: 10.1143/jjap.45.l291
Authors: Mika Kambe, Kazuo Sato, Daisuke Kobayashi, Yasuyoshi Kurokawa, Shinsuke Miyajima, Makoto Fukawa, Naoki Taneda, Akira Yamada, Makoto Konagai
Institutions: Tokyo Institute of Technology, Asahi Glass (Japan)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: bronze
OpenAlex ID: W2089028707