Work

On the annealing of damage produced by boron ion implantation of silicon single crystals

Year: 1971

Type: article

Source: Radiation Effects

DOI: 10.1080/00337577108232573

Authors: L. T. Chadderton, F. H. Eisen

Institution: University of Copenhagen

Language: English

Topic: Ion-surface interactions and analysis

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2089324971

FWCI: 3.905

Cites: 24

Cited by: 57

Related to: 10