Schottky barrier free NiSi/Si junction technology by Yb-implantation for 1xnm CMOS applications
Year: 2013
Type: conference-paper
Authors: Szu-Hung Chen, Min-Cheng Chen, Hung-Min Chen, Chuan-Feng Shih, Shih-Hsiung Wu, Yi-Ying Ho, Yu-Sheng Lai, Shou-Ji Chen, Kent Liu, Bo-Yuan Chen, Dong-Yen Lai, Chang-Hsien Lin, Chia-Yi Lin, Fu-Kuo Hsueh, Chi-Ming Wu, Cho-Lun Hsu, Wen-Cheng Chiu, Chun-Chi Chen, A. Liu, Ching-Tai Hsu, Cheng-San Wu, Mei-Yi Lee, Tong-Huan Chou, Jie-Yi Yao, Yi-Ling Shen, Qiong-Zi Hsu, Kun-Lin Lin, Chien-Ting Wu, Mei-Ling Kuo, Chi-Hui Yang, Wen-Fa Wu, ChiaHua Ho, Chenming Hu, Fu-Liang Yang
Language: English
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
Funder: National Science Council
OpenAlex ID: W2089878751