Work

Developments of TaN ALD Process for 3D Conformal Coatings

Year: 2011

Type: article

Source: Chemical Vapor Deposition

DOI: 10.1002/cvde.201100045

Authors: Virginie Brizé, Thomas Prieur, Perrine Violet, Laurent Artaud, Grégory Berthomé, Elisabeth Blanquet, Raphaël Boichot, Stéphane Coindeau, Béatrice Doisneau, Alexis Farcy, Arnaud Mantoux, Ioana Nuta, Michel Pons, Fabien Volpi

Institutions: Institut polytechnique de Grenoble, Centre National de la Recherche Scientifique, Université Joseph Fourier, Science et Ingénierie des Matériaux et Procédés, STMicroelectronics (France)

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2089969438

FWCI: 0.867

Cites: 32

Cited by: 8

Related to: 10