Work

Efficient fabrication of complex nano-optical structures by E-beam lithography based on character projection

Year: 2014

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.2040206

Authors: Uwe D. Zeitner, Torsten Harzendorf, Frank Fuchs, Michael Banasch, Holger Schmidt, Ernst-Bernhard Kley

Institutions: Fraunhofer Institute for Applied Optics and Precision Engineering, Friedrich Schiller University Jena, Vistec Electron Beam (Germany)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2090197276

FWCI: 2.007

Cites: 5

Cited by: 7

Related to: 10