Work

New mask format for low-energy electron-beam proximity projection lithography

Year: 2002

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.477009

Authors: Kaoru Koike, Shinji Omori, Kazuya Iwase, Isao Ashida, Shigeru Moriya

Institution: Sony (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2091761875

FWCI: 1.502

Cites:

Cited by: 4

Related to: 10