Work

Fabrication of chevron patterns for patterned media with block copolymer directed assembly

Year: 2011

Type: article

Source: Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

DOI: 10.1116/1.3650697

Authors: Guoliang Liu, Paul F. Nealey, Ricardo Ruiz, Elizabeth Dobisz, Kanaiyalal C. Patel, Thomas R. Albrecht

Institutions: University of Wisconsin–Madison, Hitachi Global Storage Technologies (United States)

Language: English

Topic: Block Copolymer Self-Assembly

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2092052273

FWCI: 0.97

Cites: 32

Cited by: 15

Related to: 10