Work

Nanometer scale patterning of GaN using nanoimprint lithography and Inductively Coupled Plasma etching

Year: 2014

Type: article

Source: Microelectronic Engineering

DOI: 10.1016/j.mee.2014.11.003

Authors: M. Ekielski, M. Juchniewicz, M. Płuska, M. Wzorek, E. Kamińska, A. Piotrowska

Institution: Institute of Electron Technology

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: European Commission, European Regional Development Fund

OpenAlex ID: W2092234481

FWCI: 0.497

Cites: 20

Cited by: 7

Related to: 10