Poly(ether sulfone) as a negative resist for electron beam lithography
Year: 2007
Type: article
Source: Applied Physics Letters
DOI: 10.1063/1.2740582
Authors: R. M. Bryce, M. R. Freeman, M. Aktary
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2092298237