Year: 1980
Type: article
Abstract: The carrier concentration and the Hall mobility in plastically deformed n-type silicon crystals are measured as a function of the temperature and the density of dislocations introduced. The results show that the deformation-induced defects act as acceptors. The acceptor level is found to be located between 0.34 eV and 0.42 eV above the valence band, being higher for higher densities of dislocations introduced.
DOI: 10.1143/jjap.19.l629
Authors: Haruhiko Ono, Koji Sumino
Institution: Tohoku University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: bronze
OpenAlex ID: W2095437286
