Work

Simple Technique for Direct Patterning of Nanowires using a Nanoslit Shadow-Mask

Year: 2007

Type: conference-paper

Abstract: Nanowires of various lengths and widths have been fabricated using a wafer-scale shadow mask with deposition windows, or nanoslits, created with focused ion beam machining. Metallic nanowires with widths down to 50 nm and lengths up to 100 μm have been realized. Measurements of electricalI-Vcharacteristics show linear behavior of nanowires with widths and thickness each around 50nm.

Source: International Conference on Solid-State Sensors, Actuators and Microsystems

DOI: 10.1109/sensor.2007.4300103

Authors: H.D. Tong, H.V. Jansen, N.R. Tas, V.J. Gadgil, E.T. Carlen, A. van den Berg

Institution: University of Twente

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: green

OpenAlex ID: W2098097475

FWCI: 2.152

Cites: 7

Cited by: 2

Related to: 10