Work

A Comparative Study of Cr2O3 Thin Films Obtained by MOCVD using Three Different Precursors

Year: 2005

Type: article

Source: Chemical Vapor Deposition

DOI: 10.1002/cvde.200406360

Authors: G. Carta, M. Natali, G. Rossetto, P. Zanella, G. Salmaso, S. Restello, V. Rigato, S. Kaciulis, A. Mezzi

Language: English

Topic: Metal and Thin Film Mechanics

Subfield: Mechanics of Materials

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2103015456

FWCI: 3.244

Cites: 18

Cited by: 48

Related to: 10