Work

Electrical destruction of amorphous tantalum and niobium oxide films

Year: 2003

Type: conference-paper

Source: IEEE International Conference on Solid Dielectrics

DOI: 10.1109/icsd.1992.225022

Author: S.D. Khanin

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2103019199

FWCI:

Cites:

Cited by: 6

Related to: 10